Discrete distance transforms

Optimum design of chamfer masks for sequential operations

In this submission, we have provided three error metrics, namely mean absolute error (MAE), logarithm of the relative accuracy (RLog), and symmetric mean absolute percentage error (SMAPE), that can help to devise optimization problems for computing optimal chamfer masks. Also, the codes implement error curves caused by estimating a uniform disc from chamfer polygons. Additionally, algorithms to estimate integer-valued chamfer masks from their corresponding real-valued counterparts have been implemented.
Note that MAE was proposed in the paper by Butt et al.,"Optimum Design of Chamfer Distance Transforms". And, for RLog and SMAPE, we have submitted the corresponding papers for consideration of publications at the Journal of Computer Vision and Image Understanding, and IEEE Transactions on Image Processing.